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<title>
<string language="el">Charging and Discharging Processes in AlN Dielectric Films Deposited by Plasma Assisted Molecular Beam Epitaxy</string>
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<language>eng</language>
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<entry>http://hdl.handle.net/10795/2976</entry>
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<string language="el">φυσικές επιστήμες</string>
<string language="el">ηλεκτρονική</string>
<string language="el">ηλεκτρολογικό υλικό</string>
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<string language="el">In the present work the electrical properties of AlN polycrystalline films deposited at low temperatures by plasma-assisted molecular beam epitaxy (PA-MBE) are investigated. The polarization build-up during constant current injection as well as the depolarization process after the current stress have been investigated through monitoring voltage transients in Metal – Insulator – Metal (MIM) capacitors, in temperature range from 300 K to 400 K. Moreover, current – voltage characteristics obtained at different temperatures revealed that charge collection at low fields in these films occurs through variable range hopping.</string>
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<string language="el">4 pp.</string>
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<entity><![CDATA[BEGIN:VCARD
FN: Koutsoureli, M.
N: Koutsoureli, M.
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<value>Scientific Coordinator</value>
<entity><![CDATA[BEGIN:VCARD
FN: Παπαϊωάννου, Γεώργιος
N: Παπαϊωάννου, Γεώργιος
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FN: Εθνικό και Καποδιστριακό Πανεπιστήμιο Αθηνών (ΕΚΠΑ)
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<date>
<dateStamp>2012</dateStamp>
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<string language="el">AlN polycrystalline films</string>
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<keyword>
<string language="el">Plasma-assisted molecular beam epitaxy</string>
</keyword>
<keyword>
<string language="el">MEMS devices</string>
</keyword>
<keyword>
<string language="el">MEMS switches</string>
</keyword>
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<location>http://repository.edulll.gr/edulll/bitstream/10795/2976/2/2976_1.84_%ce%94%ce%97%ce%9c_15_10_12.pdf</location>
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<entry>http://hdl.handle.net/10795/2976</entry>
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FN:National Documentation Centre - National Hellenic Research Foundation
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<date><dateTime>2016-04-27T11:51:15Z</dateTime></date>
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